机读格式显示(MARC)

• 000 00990nam0 2200241 450

• 001 0000386937

• 005 20241024155248.0

• 010 __ |a 978-7-302-66418-5 |b 精装 |d CNY128.00

• 100 __ |a 20241015d2024 em y0chiy0110 ea

• 101 0_ |a chi

• 102 __ |a CN |b 110000

• 105 __ |a a z 000yy

• 106 __ |a r

• 200 1_ |a 现代集成电路工厂中的先进光刻工艺研发方法与流程 |A xian dai ji cheng dian lu gong chang zhong de xian jin guang ke gong yi yan fa fang fa yu liu cheng |b 专著 |d Advanced lithography process r&d methodology and procedures in modern integrated circuit factories |f 李艳丽，伍强编著 |z eng

• 210 __ |a 北京 |c 清华大学出版社 |d 2024

• 215 __ |a 11,329页 |c 图，彩照 |d 26cm

• 225 1_ |a 先进集成电路工艺技术丛书

• 510 1_ |a Advanced lithography process r&d methodology and procedures in modern integrated circuit factories |z eng

• 606 0_ |a 光刻设备 |x 研究

• 690 __ |a TN305.7 |v 5

• 701 _0 |a 李艳丽 |A li yan li |4 编著

• 701 _0 |a 伍强 |A wu qiang |4 编著

• 801 _2 |a CN |b 58marc.cn |c 20241025